YT820Z020 STP-iXA3306C ISO250F

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YT820Z020
STP-iXA3306C ISO250F

YT820Z020 - STP-iXA3306C ISO250F

Overview

The STP-iXA3306 series magnetically levitated turbomolecular pump provides industry-leading performance and incorporates a small power supply into the onboard control unit – the latest technology of the well-established STPiXA3305 series.
The height of the pump is equal to the STP-XA2703/XA3203 and is also equal to the height of the STP-iXA3305 series without its power supply (iPS-1200). This fully integrated product offers easy installation and a small footprint as an all-in-one solution for all application tools.
 

Applications

  • Plasma etch (chlorine, fluorine and bromine chemestries) for metal (aluminium), tungsten and dialectric (oxide) and polysilicon
  • Electron cyclotron resonance (ECR) etch
  • Film deposition CVD, PECVD, ECRCVD, MOCVD
  • Sputtering
  • Ion implantation source, beam line pumping and station

Features and Benefits

  • Compact design including a fully integrated controller
  • Innovative, self-sensing magnetic bearing system
  • Digital 5-axis control
  • Vibration levels reduced by 50% compared to the existing turbo pumps
  • Can be configured to run corrosive processes

Technical Data

Inlet flange size ISO250F / VG250 / ICF305
Backing port size KF40
Pumping speed N2 2650 ls-1
Pumping speed Ar 2300 ls-1
Compression ratio N2/H2 >108 / 2 x 103
Ultimate pressure 10-7 Pa (10-9 Torr)
Allowable backing pressure 266 Pa (2 Torr)
Max gas flow N2 *(water cooled only) 4000 sccm
  (6.76 Pam3s-1)
Max gas flow Ar * (water cooled only) 2100 sccm
  (3.55 Pam3s-1)
Rated speed 27700 rpm
Starting time <10 minutes
Mounting position Any orientation
Input voltage 200-240 V
Max input power without TMS 1500 VA
Max input power with TMS 1800 VA
Weight 80 kg


* The maximum gas flow is applicable under conditions that N2 or Ar gas is pumped continuously with water cooling temperature under 25º C and the backing pump (10,000 l/min size) is used. It is changed on condition.